Lithographic Processes

There are a number of photolithographic processes that are frequently used in the NNF.  A brief overview of each process can be obtained by following the links on the menu. In general, the processeses are organized by the photoresist used in the process.  Most of our resists are designed for exposure in the violet and ultraviolet region of the spectrum.   The MA6 is a broadband tool, which use a mercury arc lamp as the light source.  The MJB3 is filtered to pass only light with wavelengths shorter than 350 nm (this may require some testing to determine appropriate exposure dose values).  The GCA I line stepper, being a reduction/projection tool, is tightly filtered to pass only the 365 nm wavelength, and our Raith 150-Two ebeam writer uses electrons to image the PMMA resist down to 10 nm.
Researchers are using other resists and developers in our cleanroom for experimental purposes.  If you wish to do this, please acquire the appropriate Material Safety Data Sheets (MSDS’s) and contact the Lab Manager, Marcio Cerullo.

Since we are a research facility, doing small lots on different substrates under constantly varying conditions, and generally doing things not done before by others, there is always some risk in developing your own lithographic process, even with these commonly used processes mentioned above.  Therfore, some time should be planned to develop and verify the particular process you will need for your unique project.

On the other hand, we welcome unusual approaches that would not be feasible or even permitted in a production facility.  We are always ready to discuss your particular needs and questions.  Please feel free to contact the lithography engineer or the Lab Manager, Marcio Cerullo 919-515-5054 (mcerull@ncsu.edu) for your specific needs.