The facility is equipped to handle a large variety of lithographic needs.  The following tools are available to our users:

• Printing Tools
  • Mask Aligners for Contact Lithography
  • I-Line Lithography - GCA Stepper
  • Deep UV (193 nm) lithography
  • Nanoimprinter
  • Bioforce Enabler
• Photoresist Spinners
  
  • Headway Spinner
  • Laurell Spinner
  • Laurell Spinner (multi-input)
  • Spin Track
• Photoresist Developing
  • Develop Track