Oxide Etching & Photoresist Removal Hood

This is a polypropylene fume hood manufactured by NuAire for wet processing applications. It features a Vertical Laminar Flow.  The hood includes four polyproylene tanks and a Quench rinse tank from Air Control for rinsing the wafers in deionized water with nitrogen agitation.

Two of these tanks are dedicated to photoresist removal in the Cyantek Nanostrip solution.  One tank is used for 10:1 Buffered Oxide Etchant, by JT Baker.

The standard wafer size is 6 inches. Care must be used when processing small pieces since the tendency is to float when first put in the rinse tank.  Teflon baskets are available for processing small pieces. Beakers can also be used for this purpose.

Nanostrip:

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BOE Tank Oxide Etch:

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BOE Separate Container Oxide Etch:

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